JEOL 2010F Field Emission Transmission Electron Microscope

Transmission electron microscopy examines structure by passing electrons through the specimen. The image is formed as a shadow of the specimen on a phosphorescent screen. In order for electrons to pass through the specimen, it must be very thin (usually less than 100 nanometers or approx. 1/25,000 inch) thick. High resolution sameples must be at least 1/5 this thickness to approach the resolution that this microcope is capable of. Specimen preparation requires considerable precision equipment, time and skill. TEM is typically used to examine the internal organization of objects of many kinds, but typically extemely thin and very clean. The JEOL 2010F is used for nanotechnology applications requiring higher resolution than the JEOL 2000 and Zeiss 10. Clean specimens and high resolution imaging methods must be used to optimize samples.

JEOL 2010-F Field Emission TEM Characteristics useful magnification: to X 8,000,000 high resolution field emission source producing a coherent electron beam Planned Gatan GIF and Electron Energy Loss Spectrometer Planned X-ray detector (detects elements down to boron), with spatial resolution to as little as 2 nanometers (on ideal thin sections) X-ray analyzer with digital imaging capability, X-ray mapping, feature analysis and quantitative software. Still in testing with ideal samples

Information is also available on:

• JEOL 2010F manual - not yet available
• JEOL 2010F schedule - not yet available
• Imaging modes available
• Research and educational programs